The dust blocking efficiency of a mask is based on its blocking efficiency against fine dust, especially respirable dust below 2.5 microns.
Because dust of this particle size can directly enter the alveoli, it will have a serious impact on human health.
The PTFE nanomask filter membrane made by the Suzhou PTFE filter membrane manufacturer by mechanically stretching PTFE material can ensure the complete retention of impurities such as bacteria and has a large flux.
The material is resistant to high temperatures, strong acids and alkalis, and has wide chemical applicability. When used for gas filtration, it can achieve 100% retention of various phages, bacteria and particles above 0.02um.
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