PTFE dust removal membrane is washable



Polytetrafluoroethylene dust removal membrane has the characteristics of high power, easy cleaning and washable. Surface filtration mechanism, small and uniform pore size, porosity up to 80%~90%, filtration eff…

Polytetrafluoroethylene dust removal membrane has the characteristics of high power, easy cleaning and washable. Surface filtration mechanism, small and uniform pore size, porosity up to 80%~90%, filtration efficiency up to 99.999995%. Polytetrafluoroethylene dust removal film has strong hydrophobicity, low surface energy, and good non-adhesion. It is easy to remove dust accumulated on the surface of the material, so it can be rinsed with water to restore its performance and achieve repeated use. Compared with other filter materials, it has a higher PF value and good filtering performance.

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Is a manufacturer integrating production, sales and customization. The company has advanced PTFE film production lines and composite production lines. The company’s products are widely used in various fields and are committed to providing users with high-tech, high-quality, high-performance, and high-level products.

It is a high-tech enterprise focusing on the research and development, production and sales of polytetrafluoroethylene dust removal membrane, with nearly 4,000 square meters meters of factory building area, professional production equipment and strong scale, we are a partner of Fortune 500 companies in the United States; the products we produce are all produced from imported raw materials, with finer molecular weight, cleaner quality and better uniformity. Moreover, we have a full set of advanced production equipment and testing instruments, as well as a complete pre-sales, sales and after-sales service system. If you are interested, please enter the store for consultation.

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This article is from the Internet, does not represent Composite Fabric,bonded Fabric,Lamination Fabric position, reproduced please specify the source.https://www.tradetextile.com/archives/6640

Author: clsrich

 
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