Fabric Products,Fabric Information,Fabric Factories,Fabric Suppliers Fabric News Why do film masks use polytetrafluoroethylene mask membrane?

Why do film masks use polytetrafluoroethylene mask membrane?



Why do film masks use polytetrafluoroethylene mask membrane? The surface of the film mask is composed of 100~200 nanofibers staggered into holes. After the fiber diameter is reduced to the nanometer level, the …

Why do film masks use polytetrafluoroethylene mask membrane?

The surface of the film mask is composed of 100~200 nanofibers staggered into holes. After the fiber diameter is reduced to the nanometer level, the surface area increases, the pore size becomes smaller, and the pore volume increases, which can effectively block PM2.5.

In addition to the polytetrafluoroethylene mask film, it also polymerizes other four layers of protective materials such as PP (polypropylene) and ES (skin-friendly and anti-allergic material). With five layers of protection, the mask is still very light and thin, and the breathing resistance is only 60~70pa. It is much lower than the 120~250pa breathing resistance of traditional N95 masks.

It is a manufacturer of polytetrafluoroethylene (ptfe) membrane environmentally friendly materials that specializes in R&D, production and sales.

With strong technical force and strict management system, the company ensures that everything focuses on the interests of users. Interested parties can enter the store for consultation.


Disclaimer:

Disclaimer: Some of the texts, pictures, audios, and videos of some articles published on this site are from the Internet and do not represent the views of this site. The copyrights belong to the original authors. If you find that the information reproduced on this website infringes upon your rights, please contact us and we will change or delete it as soon as possible.

AA

This article is from the Internet, does not represent Composite Fabric,bonded Fabric,Lamination Fabric position, reproduced please specify the source.https://www.tradetextile.com/archives/59455

Author: clsrich

 
Back to top
Home
News
Product
Application
Search