Nanofiltration dust removal material ptfe dust mask film

The ptfe dust mask membrane is prepared using a unique biaxial stretching technology, which can ensure complete retention of bacteria and other impurities while having a large flux.

The material is resistant to high temperatures, strong acids and alkali, and has wide chemical applicability. When used for gas filtration, it can achieve 100% retention of various phages, bacteria and particles above 0.02um.

The ptfe dust mask membrane has undergone high-temperature heat setting treatment. The microporous structure is very stable and can effectively intercept dust particles.

The pore size of the material is small and the distribution is concentrated. Surface filtration is achieved to achieve a dust removal efficiency of 99.9%~99.999%. For some extremely small particles with a diameter of 0.1um-0.3um, it can better prevent fine dust from entering the filter material.

Can operate at a continuous operating temperature of 240°C and an instantaneous temperature of 260°C.

The company has always implemented the tenet of “quality first, reputation first”. We have a complete service system, caring before sales, attentive during sales, and assured after sales! The company can provide samples and arrange sales personnel for door-to-door service if there are other requirements.

We sincerely welcome friends from all walks of life at home and abroad to visit our company and discuss business and common development.

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